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Plasma processing
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#	Item
301	INTRODUCTION TO THE HYBRID PLASMA EQUIPMENT MODEL Prof. Mark J. Kushner University of Illinois Department of Electrical and Computer Engineering Add to Reading List Source URL: uigelz.eecs.umich.edu Language: English - Date: 1999-01-16 19:02:04 Semiconductor device fabrication Ion source Coatings Plasma physics Plasma Physical vapor deposition Inductively coupled plasma Electron cyclotron resonance Chemical vapor deposition Physics Chemistry Plasma processing
302	Nitriding HTL Fact Sheet 16 Nitriding is a surface hardening treatment that introduces nitrogen into the surface of steel at relatively low temperatures of about 520 °C. At this temperature, nitrogen reacts with the a Add to Reading List Source URL: www.heat-treat.co.nz Language: English - Date: 2012-08-26 18:10:25 Physics Plasma Chemistry Materials science Nitriding Plasma processing Case hardening
303	HiFocus280-440i_en_1-2-3-6_08... Add to Reading List Source URL: www.radikalkaynak.com Language: English - Date: 2010-03-13 11:35:26 Physics Kjellberg Finsterwalde Plasma cutting Plasma Fabrication Speeds and feeds Plasma processing Technology Metalworking
304	Manual Cutting and Gouging with FineFocus Plasma Cutting Units CUTLINE 10G CUTLINE 20G CUTLINE 40G CUTLINE 20W Add to Reading List Source URL: www.radikalkaynak.com Language: English - Date: 2010-03-13 11:31:43 Physics Plasma cutting Kjellberg Finsterwalde Plasma torch Plasma Oxy-fuel welding and cutting Plasma processing Technology Metalworking
305	Flame cutting systems Oxy-acetylene equipment Add to Reading List Source URL: www.radikalkaynak.com Language: English - Date: 2010-03-13 11:02:09 Physics Hydrogen technologies Oxygen Welding Fuels Oxy-fuel welding and cutting Plasma cutting Numerical control Acetylene Technology Plasma processing Chemistry
306	UCLA Nanoelectronics Research Facility (NRF) www.nanolab.ucla.edu Prof Rob Candler, Director Steve Franz, NRF Manager [removed] Tel: [removed] Add to Reading List Source URL: www.nanolab.ucla.edu Language: English - Date: 2013-02-21 13:00:56 Materials science Science Electron microscopy Microtechnology Plasma processing Microelectromechanical systems Chemical vapor deposition Focused ion beam Scanning electron microscope Semiconductor device fabrication Thin film deposition Chemistry
307	POPDAT: Problem Oriented Processing and Database Creation for Ionosphere Exploration[removed] Add to Reading List Source URL: www.popdat.org Language: English - Date: 2012-10-27 12:53:36 Electrical phenomena Plasma physics Space plasmas Space science Earth sciences graphics software NetCDF Ionosphere Space weather Surface wave Meteorology Atmospheric sciences Technology
308	Project of the FP7 SPACE Programme Problem-oriented Processing and Database Creation for Ionosphere Exploration Add to Reading List Source URL: www.popdat.org Language: English - Date: 2013-04-10 13:51:09 Space Plasma physics Planetary science Atmosphere Geomagnetism Ionosphere Magnetosphere Plasma Demeter Physics Space plasmas Astrophysics
309	NFC Industrial Access and Equipment Rates valid 7/1/13 to [removed]RATES SUBJECT TO CHANGE ACCESS/USE Add to Reading List Source URL: www.nano.umn.edu Language: English - Date: 2014-03-31 10:52:39 Chemistry Technology Manufacturing Chemical vapor deposition Coatings Vacuum JEOL Stepper Plasma-enhanced chemical vapor deposition Semiconductor device fabrication Thin film deposition Plasma processing
310	NFC Academic Access and Equipment Rates valid 7/1/13 to [removed]RATES SUBJECT TO CHANGE ACCESS/USE Add to Reading List Source URL: www.nano.umn.edu Language: English - Date: 2014-03-31 10:52:39 Chemical vapor deposition Coatings Plasma processing Vacuum Technology JEOL Rate Stepper Manufacturing Semiconductor device fabrication Chemistry Thin film deposition

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